• Successful installation, testing, and commissioning of Beneq TFS 200 Atomic Layer Deposition (ALD) system
• Major infrastructure upgrades completed, enabling industry-leading graphene research and development
• Parallel testing enabled with ALD system secured at Tel Aviv University

Adisyn Ltd (ASX: AI1) has announced the successful installation, commissioning, and calibration of its newly acquired Beneq TFS 200 Atomic Layer Deposition (ALD) system at its wholly owned subsidiary, 2D Generation (2DG). ALD systems are widely used in the semiconductor industry to deposit extremely thin layers of material on to chips, and 2DG has specifically selected a model customized by Beneq. The new system features plasma options for wafer surface treatments, a semi-automatic load lock for room-temperature sample exchange, and a reaction chamber suitable for wafer-scale processing. These capabilities are essential for advancing the company's proprietary low-temperature graphene deposition process, which aims to overcome existing performance barriers in semiconductor interconnects. The commissioning follows the successful completion of a substantial infrastructure upgrade at the 2DG facility, including environmental control systems and high-specification electrical works to support the precision demands of ALD-based research. The new ALD system will operate in tandem with the Beneq TFS 200 system located at Tel Aviv University's Jan Koum Center for Nanoscience and Nanotechnology, allowing 2DG to run concurrent testing and accelerate the validation of graphene films across various substrates, layer structures, and operating conditions. With both ALD systems now operational, the company will commence with validating previous technical results while broadening its understanding of the building blocks for a robust, scalable process.

The company will be providing an update on its development roadmap in the Q1 FY26.