• BENEQ Atomic Layer Deposition (ALD) systems now operational
• R&D activities at the Adisyn facility, in parallel with Tel Aviv University
• Phase One activity, focused on precursor testing, graphene growth, and optimisation, underway

Adisyn Ltd (ASX: AI1) is pleased to provide shareholders with a comprehensive development update following the successful commissioning of its newly acquired Beneq TFS 200 Atomic Layer Deposition (ALD) system at its R&D facility in Israel. This milestone marks the beginning of a major phase of technical activity focused on optimising the Company's patented low-temperature graphene technology, which is designed to address one of the most significant technological bottlenecks in semiconductor manufacturing - the limitations of copper interconnects at advanced nodes (sub-5nm). Copper interconnects are reaching their physical and performance limitations in advanced semiconductor manufacturing, constraining speed, energy efficiency, and miniaturisation. Graphene, renowned for its exceptional electrical and thermal conductivity, is seen as the ideal replacement. Yet, the industry has faced a critical challenge: its inability to grow high-quality graphene directly onto wafers at semiconductor-compatible temperatures. Adisyn, through its wholly owned subsidiary 2D Generation (2DG), is addressing this issue via a patented, low-temperature ALD process using carbon-ring-based organic precursors. This approach enables direct graphene deposition at lower temperatures, making it compatible with existing semiconductor manufacturing infrastructure. The first phase of activity is focused on precursor development and involves several interdependent steps designed to establish the graphene growth sequence, including plasma pre-clean, deposition sequence, post-anneal, and characterisation and feedback. This phase is expected to continue during the balance of 2025 and into early Q1 2026, at which point the project will move into a development phase focused on recipe development, repeatability testing, wafer-scale integration, and industry collaboration. Adisyn's graphene development program is being executed by a world-class multidisciplinary team of over 20 experts in nanomaterials, ALD/CVD/PVD, organic chemistry, metrology, surface science, and semiconductor fabrication, with key leadership from globally recognised executives.

Adisyn believes this low-temperature ALD graphene growth process, if scalable and repeatable, has the potential to unlock a new generation of semiconductor interconnects. The Company will continue to provide regular updates as development milestones are achieved.