Ultranode X achieves more than 1,000 Cycles at 80% Capacity

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Stock Anteotech Ltd (ADO.ASX)
Release Time 17 Nov 2025, 9:30 a.m.
Price Sensitive Yes
 Ultranode X achieves over 1,000 cycles at 80% capacity
Key Points
  • Ultranode™ X anode achieved over 1,000 charge/discharge cycles at 80% capacity retention
  • Milestone meets key cycle-life benchmark for EV and eVTOL applications
  • Ultranode™ X uses cost-effective micron-sized pure silicon material, eliminating need for expensive silicon/carbon composites
Full Summary

AnteoTech Ltd (ASX: ADO) has announced that its Ultranode™ X, a high silicon (70% silicon content) anode designed for high-energy and long-cycle life products, has achieved a major development milestone of more than 1,000 charge/discharge cycles at 80% capacity retention. This achievement meets a key cycle-life benchmark often requested for Electric Vehicle (EV) and Electric Vertical Take-Off and Landing (eVTOL) applications. AnteoTech's proprietary Ultranode™ X anode uses cost-effective micron-sized pure silicon material rather than highly engineered and expensive silicon/carbon (Si/C) composite powder. Ultranode™ X utilises globally and commercially available silicon, sourced through established supply chains, reducing risk from potential trade restrictions scale up. The ABT team achieved this major milestone in November 2025 through improvements in Ultranode formulation and cell design, resulting in electrodes that achieved 1,020 full discharge and charge cycles at 80% capacity retention. This industry leading result, understood to be an industry first using micron-sized pure silicon powder, is expected to accelerate existing potential customer and partnership discussions and open new opportunities. The 1,000-cycle mark has often been referenced as a requirement for EV batteries, and AnteoTech expects to continue to improve Ultranode™ X and push performance levels even further.

Outlook

AnteoTech expects to continue to improve Ultranode™ X and to continue to push performance levels even further.