Racura Oncology Emory University Collaboration

• Collaborative program led by Prof. Shi-Yong Sun, a world-leader in osimertinib resistant lung cancer biology
• Provides Racura access to Emory's unique osimertinib resistant cell and mouse NSCLC models and expertise
• Program supports the HARNESS-1 clinical trial of (E,E)-bisantrene (RC220) aimed at delaying or preventing resistance to osimertinib in EGFRm NSCLC patients

Racura Oncology Ltd has announced a collaboration with Emory University (Atlanta, GA, USA) to study (E,E)-bisantrene (RC220) in osimertinib resistant epidermal growth factor receptor mutated (EGFRm) non-small cell lung cancer (NSCLC). The collaborative program is led by Professor Shi-Yong Sun, a recognised world-leader in osimertinib resistant lung cancer biology. The collaboration provides Racura access to Emory's unique osimertinib resistant cell and mouse NSCLC models and expertise. Preliminary data from the collaboration has demonstrated significant synergy between osimertinib and RC220 in the established HCC827/AR osimertinib resistance lung cancer mouse model. The collaboration will further strengthen Racura's scientific foundation and support ongoing and future discussions with key opinion leaders, regulators, and pharmaceutical partners. Professor Sun has published extensively on the molecular mechanisms that drive resistance to osimertinib in EGFRm NSCLC, including the critical importance of MYC, h-TERT/telomerase and topoisomerase IIa, which are known targets of (E,E)-bisantrene. This research complements Racura's HARNESS-1 clinical trial by further characterising the underlying biology and mechanism(s) of action of RC220, as well as helping optimisation of the clinical program. The collaboration is expected to last more than 12 months, with the intention to publish the results in high-impact, peer-reviewed journals.

Racura is actively exploring partnerships, licence agreements, or a commercial merger and acquisition to accelerate access to RC220 for patients with cancer across the world.