• Successful validation of a key sub-process within the pre-clean sequence
• Independent expert confirms low-temperature deposition of an sp²-based carbon layer
• Deposition capability represents an important step toward potential process integration and scalability

Adisyn Ltd (ASX: AI1) has reported significant progress in the development of its low-temperature graphene deposition technology, achieving a pivotal technical milestone in its pre-clean stage. The company successfully validated a key sub-process within the pre-clean sequence, effectively preparing wafer surfaces for graphene growth. Post period-end, an independent expert confirmed the successful low-temperature deposition of an sp²-based carbon layer using an Atomic Layer Deposition (ALD) system. This achievement represents an important technical validation and de-risking step in Adisyn's graphene deposition development program, with the deposition capability creating a crucial step toward potential industry integration and scalability. The company will now progress into the next phase of its graphene deposition development program, expanding deposition trials, refining remaining sub-processes, and optimizing deposition parameters. Adisyn also announced the completion of a strategic review of its business units, identifying significant opportunities to improve scale and unlock potential via greater capital allocation to the semiconductor business.

Adisyn reported cash receipts of ~$1m and total revenue for the quarter of $860k. The company has a strong balance sheet with A$4.9m in cash and is debt-free.