AI1 Major Graphene Scale-Up Milestone on 200mm Wafer

• Adisyn successfully scaled graphene deposition to a 200mm wafer
• Independent testing confirmed graphene at 12 sampled locations
• Achievement represents significant step towards commercial applications
• Milestone achieved ahead of internal development expectations

Adisyn Ltd announced a significant technical milestone in the development of its graphene semiconductor technology, successfully scaling its low-temperature graphene deposition process to a full 200mm Cu semiconductor wafer. The deposition was done below 300°C. The achievement represents a significant increase from the Company's earlier laboratory-scale work and moves Adisyn's technology into an industry-standard wafer format widely used across global semiconductor manufacturing. This is the first publicly disclosed demonstration of low-temperature graphene deposition across an entire 200mm wafer. Independent testing confirmed graphene at all 12 sampled locations, supporting successful deposition across the full 200mm wafer diameter.